Studies of the reactive ion etching of SiGe alloys
Studies of the reactive ion etching of SiGe alloys G. S. Oehrlein, G. M. W. Kroesen, E. de Fresart, Y. Zhang, andT. D. Bestwick IBM Research Division,...
Studies of the reactive ion etching of SiGe alloys G. S. Oehrlein, G. M. W. Kroesen, E. de Fresart, Y. Zhang, andT. D. Bestwick IBM Research Division, T. J. Watson Research Center, Yorktown Heights, New York 10598
Reactive-ion etching (RIE) of epitaxial, strained Sil x Gex alloys, x