Robert Bristol (Intel) Will Conley (Freescale) Ralph Dammel (AZ-EM) Donis Flagello (ASML) Toshiro Itani (SELETE) Winfried Kaiser (Carl Zeiss) Hyun-Woo Kim (Samsung) Jongwook Kye (AMD) Burn Lin (TSMC) Jan Macie (Makos) (Brewer Science)
• • • • • • • • • •
Arpan Mahorowala (IBM) Katsumi Ohmori (TOK) Soichi Owa (Nikon) Eric Panning (Intel) Kurt Ronse (IMEC) Mordechai Rothschild (MIT/LL) Bruce Smith (RIT) Akiyoshi Suzuki (Canon) Takayuki Uchiyama (NEC) David Van Steenwinckel (NXP)
Flashback to the 2007 Symposium (in Keystone, CO) • 2007 Critical issues list 1 2 3 4 5 6 7 8 9 10 11 12 13
LuAG glass development Timing/Economics issues High index fluids -- G2 manufacturing readiness High Index fluids -- G3 research Double exposure material (2 flash/1 etch) development Double patterning development -- hardware/materials Double resist coats/sidewall imaging/resist freezing High index resist development Double patterning development -- modeling/pattern split Other lens material solutions for RI > 1.56 193 nm resist development (resolution/LWR/sensitivity) Intermediate goals? (BaLiF???) Large angle patterning
Change in symposium scope • Total number of abstracts: 66 (2007) Æ 63 (2008) • New symposium scope (towards extendibility of immersion lithography) is reflected in this year’s symposium title and program with > 25 abstracts on defectivity/top coats/…
Immersion Symposium Dinner – Tuesday September 23, 2008. • Shuttle buses from World Forum to Madurodam available from 5.30pm-6.00pm. • Walking distance from World Forum to Madurodam: 1200m (20min walk). • Dinner starts at 6pm with a reception and possibility to visit the miniature city. • Shuttle buses to the symposium hotels will be available after the dinner (10pm).
World Forum
Madurodam
Practical information • The Hague – information guide, city maps, public transport (tram) map
Other Program Information • Abstracts available on memory stick in your bag • 2 Flyers with program/posters in your bag • Wednesday start at 8:25 (last minute cancellation of DM01) – Breakfast available from 7:30 onwards
• Posters will be displayed throughout the symposium • Presentations and posters will be distributed through the Sematech website after the symposium – Notification will be sent by e-mail to all Symposium attendees
• Poster/paper presenters: hand in your presentation for distribution through website – at the stage during one of the breaks
• Please use the audience microphones for your questions and put your cell phones in silent mode.
Lithographer’s Prayer by Kit Ausschnitt E-beams can raster but photons are phaster. Ions may take charge but be way too large. Should anyone ask the hard x-ray task is still in the mask. Reflective remorse doth EUV force by dim mask and source.